Silicon Wafer Cleaning: A Fundamental and Critical Step in Semiconductor Fabrication Process

Abstract

silicon is the most interesting and useful semiconductor material in fabrication of numerous semiconductor devices. In semiconductor device fabrication, the various processing steps fall into four general categories i.e. deposition, removal, patterning and modification of electrical properties. In every steps, wafer cleaning is the primary and principle step for developing semiconductor based electronic devices. cleaning process is the removal of chemical and particle impurities without altering or damaging the wafer surface or substrate. Here in this paper, silicon wafer cleaning procedures has been reviewed in sort. Some basic concepts about clean room were also described in brief.